Water soluble photoresist composition with bisazide, diazo, poly

Details Water soluble photoresist composition with bisazide, diazo, poly Water soluble photoresist composition with bisazide, diazo, poly

1983-02-18

1985-01-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 28, 430165, 430167, 430177, 430179, 430196, 430197, 430272, G03C 160, G03C 170, G03F 726

Patent

active

044916299

ABSTRACT:
Photoresist compositions based upon a water-soluble polymer are disclosed together with a water-soluble bisazide compound as a cross-linker, a water-soluble adhesion-improving diazo compound are characterized in that a water-soluble silane compound is included. The compositions are photosensitive, particularly to ultraviolet rays, and adhere well to the substrates to which they are applied. The compositions of the invention are used as photoresists.

REFERENCES:
patent: 2937085 (1960-05-01), Seven et al.
patent: 3387975 (1968-06-01), Tamura
patent: 3549368 (1970-12-01), Collins et al.
patent: 3615538 (1971-10-01), Peters et al.
patent: 3679419 (1972-07-01), Gillich
patent: 3917794 (1975-11-01), Akagi et al.
patent: 4099973 (1978-07-01), Miura et al.

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