Water-soluble photopolymer and method of forming pattern by use

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430270, 430280, 430271, 430272, 430273, 430311, 430312, 430339, 430396, 430494, 430512, 430514, 430507, 430515, 430516, 522 88, 522 89, G03C 1495, G03C 152, G03C 171, G03C 516

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047450428

ABSTRACT:
This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.
The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography. Besides, when it is applied in said pattern forming method, much finer patterns may be formed.

REFERENCES:
patent: 3511653 (1970-05-01), Wiebe
patent: 3515551 (1970-06-01), Audran et al.
patent: 3595657 (1971-07-01), Robinson et al.
patent: 3960685 (1976-06-01), Sano et al.
patent: 3965278 (1976-06-01), Duinker et al.
patent: 4025191 (1977-05-01), Seward, III
patent: 4029616 (1977-06-01), Nakashio et al.
H. J. Zweig, "Nonlinear Filter", IBM Technical Disclosure Bulletin, vol. 8, No. 7, Dec. 1965, p. 980.

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