Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1985-04-17
1988-05-17
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430270, 430280, 430271, 430272, 430273, 430311, 430312, 430339, 430396, 430494, 430512, 430514, 430507, 430515, 430516, 522 88, 522 89, G03C 1495, G03C 152, G03C 171, G03C 516
Patent
active
047450428
ABSTRACT:
This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.
The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography. Besides, when it is applied in said pattern forming method, much finer patterns may be formed.
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H. J. Zweig, "Nonlinear Filter", IBM Technical Disclosure Bulletin, vol. 8, No. 7, Dec. 1965, p. 980.
Endo Masayuki
Nomura Noboru
Sasago Masaru
Takeyama Kenichi
Hamilton Cynthia
Matsushita Electric - Industrial Co., Ltd.
Michl Paul R.
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