Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-09-13
1992-12-22
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430311, 430326, G03C 154, G03C 160, G03F 7022, G03F 7023
Patent
active
051733900
ABSTRACT:
A water soluble contrast enhancement compound and composition, and a method of use thereof, are disclosed for improving sidewall profiles in photoresist patterning and developing. The compound consists of a 1-oxy-2-diazonaphthalene sulfonamide salt.
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patent: 3890152 (1975-06-01), Ruckert
patent: 3965278 (1976-06-01), Duinker
patent: 4672021 (1987-06-01), Blumel
patent: 4997742 (1991-03-01), Covington
Covington John B.
Kim Peter
Marriott Vic B.
Venable Larry G.
Cantor Jay
Donaldson Richard L.
Duda Kathleen
McCamish Marion E.
Stoltz Richard A.
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