Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2011-05-31
2011-05-31
Loney, Donald (Department: 1783)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S039000, C216S052000, C216S091000, C216S099000, C438S460000, C438S691000
Reexamination Certificate
active
07951300
ABSTRACT:
Methods for wafer-scale fabrication of needle arrays can include mechanically modifying a wafer to produce a plurality of vertically-extending columns. The columns are etched to round and reshape the columns into substantially uniformly shaped needles. Needle arrays having needle width non-uniformity of less than about 3% and length non-uniformity of less than about 2% can be produced.
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Bhandari Rajmohan
Negi Sandeep
Normann Richard A.
Solzbacher Florian
Loney Donald
Thorpe North & Western LLP
University of Utah Research Foundation
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