Water-removing exhaust system for an ion implanter and a method

Details Water-removing exhaust system for an ion implanter and a method Water-removing exhaust system for an ion implanter and a method

1997-11-06

1999-01-05

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25044111, H01J 3717

Patent

active

058566767

ABSTRACT:
An exhaust system of an ion implanter that eliminates moisture in the process stream comprises: an exhaust pump positioned within the ion implanter; a main exhaust duct positioned outside the ion implanter; an exhaust line extending between the exhaust pump and the main exhaust duct; a gas introduction unit for introducing a moisture eliminating gas into the exhaust line; and a scrubber for removing a predetermined gas from the process stream. By introducing the moisture-eliminating gas (which is preferably heated nitrogen) into the process stream, moisture contained therein is removed from the stream, and the events described hereinabove that produce a corona discharge within the exhaust line are prevented.

REFERENCES:
patent: 5731592 (1998-03-01), Oh et al.

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