Water reclamation rate in semiconductor fabrication wet benches

Details Water reclamation rate in semiconductor fabrication wet benches Water reclamation rate in semiconductor fabrication wet benches

2005-04-05

2005-04-05

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including regeneration, purification, recovery or separation...

C134S018000, C137S002000, C137S005000, C210S739000, C210S746000

Reexamination Certificate

active

06875287

ABSTRACT:
Embodiments of the present invention are directed to improving the reclamation rate of the waste water of wet benches in semiconductor fabrication. In accordance with an aspect of the invention, a method for improvement of water reclamation rate comprises choosing a rinse recipe for a wet bench. The wet bench is activated, and waste water quality of waste water produced by the rinse recipe from the wet bench is detected to generate water quality data for a plurality of reclamation switch time levels. The waste water is directed to a water reclamation system during a reclamation time period after each of the plurality of reclamation switch time levels. The water quality data of the waste water is analyzed for the plurality of reclamation switch time levels. The method further comprises determining from analyzing the water quality data the best reclamation switch time for the chosen rinse recipe for the wet bench.

REFERENCES:
patent: 6178975 (2001-01-01), Aoki
patent: 6379548 (2002-04-01), Kurokawa et al.
patent: 6622745 (2003-09-01), Smith et al.
R.Donovan et al. Design of Recycling System for Spent Rinse Water from Sandia's Microelectronics Development Laboratory (MDL). Jan. 19, 2001. http://www.sandia.gov/aqua/Papers/balazs3.pdf.

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