Water laser plasma x-ray point sources

Details Water laser plasma x-ray point sources Water laser plasma x-ray point sources

1995-01-13

1996-11-19

Porta, David P.

X-ray or gamma ray systems or devices

Source

378143, H05G 200

Patent

active

055770916

ABSTRACT:
A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a laser and lithography system. The target source system comprises in a preferred embodiment a liquid tank source and freezer means which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 11.7 nm and 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank source. Optionally an auxiliary source and detector system can be used to allow for instantaneous triggering of the laser beam. The target source system can be incorporated into well known EUV lithography systems for the production of wafer chips.

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Mochizuki et al., Soft X-ray Optics & Tech., Proccedings of SPIE vol. 733, Dec. 1986, pp. 23-27.
Silfvast et al. Laser-produced plasma for soft s-ray projection lithography, J. Vac. Sci. Technol. Nov. 1992, pp. 3126-3133.
Richardson et al. Laser plasma sources for soft x-ray projection lithography, SPIE vol. 1848, Nov. 1992, pp. 483-500.
Jine et al., Mass limited laser plasma cryogenic target for 23nm point x-ray sources for lithography, SPIE vol. 2015, Aug. 1993, pp. 1-9.
Richardson et al., Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography, Applied Optics vol. 32, No. 34, Dec. 1993, pp. 6901-6910.

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