X-ray or gamma ray systems or devices – Source
Patent
1994-04-01
1995-10-17
Porta, David P.
X-ray or gamma ray systems or devices
Source
378143, H05G 200
Patent
active
054597714
ABSTRACT:
A high repetition-rate laser plasma target source system and lithography system is disclosed. The target source system comprises in a preferred embodiment a liquid tank source and freezer which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank source. Optionally an auxiliary source and detector system can be used to allow for instantaneous triggering of the laser beam. The target source system can be incorporated into well known EUV lithography systems for the production of wafer chips.
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Gabel Kai
Jin Feng
Kado Masataka
Richardson Martin
Bruce David Vernon
Porta David P.
Steinberger Brian S.
University of Central Florida
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