Water-developable, negative-working, diazo lithographic printing

Details Water-developable, negative-working, diazo lithographic printing Water-developable, negative-working, diazo lithographic printing

1984-05-25

1986-07-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430156, 430302, G03C 160, G03F 708

Patent

active

046006796

ABSTRACT:
A negative-working, water-developable, bilayer lithographic printing plate comprising a substrate having a hydrophilic surface which surface is first coated with a layer of a water-soluble, lithographically suitable, photosensitive, negative-working aromatic diazo composition and top coated with a layer of a water-permeable, water-insoluble, oleophilic, O-epoxyalkylated tetrakis (hydroxyphenyl) ethane resin and ester derivatives thereof. Upon imagewise exposure, the exposed areas become water insoluble, and development is effected by washing away the unexposed areas with water.

REFERENCES:
patent: 3905815 (1975-09-01), Bonham
patent: 4233390 (1980-11-01), Jargiello
patent: 4299893 (1981-11-01), Pigeon et al.
patent: 4334003 (1982-06-01), Jones
patent: 4447512 (1984-05-01), Rowe et al.

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