Water deposition apparatus and method

Details Water deposition apparatus and method Water deposition apparatus and method

1996-06-14

2000-09-05

Rutledge, D.

Photography

Fluid-treating apparatus

Heating, cooling, or temperature detecting

396574, 396604, G03D 1300

Patent

active

061132888

ABSTRACT:
Apparatus and method for depositing water onto the surface of a substrate passed through the apparatus. The apparatus has a housing that defines an internal atmosphere confined in at least partial isolation from the ambient atmosphere. The housing has a moisture saturation portion, a deposition portion, and a passageway. The moisture saturation portion has a water supply and a vapor reservoir. The water supply contains a quantity of water. The vapor reservoir holds a volume of the interior atmosphere in thermal and phase equilibrium with the water in the water supply. The deposition portion has a plenum wall surrounding a central chamber. The plenum wall is substantially insulated from ambient temperature variations and has a pair of opposed substrate gaps. The gaps define a path for the substrate through the chamber. The passageway communicates with the vapor reservoir and the chamber. A primary heater is disposed to heat the water in the water supply. A secondary heater is disposed within the passageway between the vapor reservoir and the chamber. A fan drives the internal atmosphere from the vapor reservoir through the passageway to the chamber. A controller is operatively connected to the primary and secondary heaters. The controller senses wet and dry bulb temperatures of the internal atmosphere in the chamber. The controller actuates the primary heater at a range of wet bulb temperatures below a predetermined wet bulb limit temperature and actuates the secondary heater at a range of dry bulb temperatures below a predetermined dry bulb limit temperature. The dry bulb limit temperature is greater than the wet bulb limit temperature.

REFERENCES:
patent: 2951007 (1960-08-01), Lippke
patent: 3470625 (1969-10-01), Chikamasa et al.
patent: 3599554 (1971-08-01), Aelterman et al.
patent: 3720150 (1973-03-01), Hurtig et al.
patent: 3805402 (1974-04-01), Aono et al.
patent: 3838000 (1974-09-01), Urbas
patent: 4088728 (1978-05-01), Godfrey
patent: 4168579 (1979-09-01), Ericsson
patent: 4188731 (1980-02-01), Rauskolb
patent: 4207143 (1980-06-01), Glomb et al.
patent: 4247990 (1981-02-01), Ohls et al.
patent: 4378639 (1983-04-01), Walker
patent: 4529563 (1985-07-01), McGinniss
patent: 4733078 (1988-03-01), Sturm
patent: 4842982 (1989-06-01), Seibel et al.
patent: 4844842 (1989-07-01), Markl et al.
patent: 4868098 (1989-09-01), Steiger et al.
patent: 4872270 (1989-10-01), Fronheiser et al.
patent: 4920202 (1990-04-01), Irie et al.
patent: 4925767 (1990-05-01), Daems et al.
patent: 4952960 (1990-08-01), Kosugi et al.
patent: 5061611 (1991-10-01), Sakata et al.
patent: 5068681 (1991-11-01), Kosugi et al.
patent: 5323546 (1994-06-01), Glover et al.
patent: 5329331 (1994-07-01), Hatori et al.
patent: 5404656 (1995-04-01), Matsuda et al.

Affiliated with

Also associated with

Rating

Water deposition apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Water deposition apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water deposition apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2205765