Chemistry: analytical and immunological testing – Determination of water
Reexamination Certificate
2006-09-19
2006-09-19
Gakh, Yelena G. (Department: 1743)
Chemistry: analytical and immunological testing
Determination of water
C436S055000, C436S149000, C436S164000
Reexamination Certificate
active
07109037
ABSTRACT:
The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
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Katagiri Yuko
Kikukawa Makoto
Morita Satoru
Nakagawa Toshimoto
Ogawa Shu
Gakh Yelena G.
Hirama Laboratories Co., Ltd.
Nagase & Co. Ltd.
Nagase CMS Technology Co., Ltd.
Osha Liang L.L.P.
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