Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1981-11-13
1984-02-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430270, 430289, 430627, 430628, 430640, 430642, 430325, G03C 160, G03C 171
Patent
active
044330430
ABSTRACT:
A water based photosensitive composition comprises a hydrolyzate of a mammal collagen and a photosensitizer serving to cross-link the hydrolyzate when exposed to an active light. The hydrolyzate has a number-average molecular weight, Mn, of 2,000 to 30,000 and an intrinsic viscosity, [.eta.], of 0.060 to 0.155 dl/g in a 0.15 mole citric acid buffer solution maintained at 40.degree.C. Also, the hydrolyzate is capable of maintaining the formability of the collagen fold. A photoresist pattern formed by using the composition exhibits a high resolution, a good dyeing property and a strong corrosion resistance.
REFERENCES:
patent: 2522771 (1950-09-01), Barnes et al.
patent: 2824000 (1958-02-01), Eckardt
patent: 2937085 (1960-05-01), Seven et al.
patent: 3748142 (1973-07-01), Battista
patent: 4145455 (1979-03-01), Fujimaki et al.
patent: 4360590 (1982-11-01), Tomka
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, pp. 55-58.
Sawada Yoshikatu
Shirakawa Kazuo
Sugiura Takeo
Bowers Jr. Charles L.
Nippi, Inc.
Toppan Printing Co. Ltd.
LandOfFree
Water based photosensitive composition with hydrolyzate of mamma does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water based photosensitive composition with hydrolyzate of mamma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water based photosensitive composition with hydrolyzate of mamma will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1035925