Compositions – Electrolytes for electrical devices
Patent
1977-01-03
1979-04-24
Gantz, Delbert E.
Compositions
Electrolytes for electrical devices
72 42, 252 495, 252 56R, 252 56S, 252 76, 252389A, C10M 148, C10M 342, C10M 524, C10M 746
Patent
active
041510992
ABSTRACT:
The present invention relates to the use, as a hydraulic fluid or metalworking lubricant, of compositions having water as a base and yet possessing superior lubricating and wear preventing characteristics. The fluids of the invention comprise (1) a water-soluble polyoxyethylated ester of an aliphatic acid and a monohydric or polyhydric aliphatic alcohol, either one or both said acid and said alcohol being polyoxyethylated (2) a sulfurized molybdenum or antimony compound or alternatively mixtures of (1) and (2) with (3) a phosphate ester. The compositions can be thickened, if desired, using for instance polyglycol, polyacrylic and polyvinyl alcohol type thickeners. The use of corrosion inhibitors, metal deactivators and other adjuvants conventional in this art is also contemplated.
REFERENCES:
patent: 3222284 (1965-12-01), Cook
patent: 3249538 (1966-05-01), Freier
patent: 3400140 (1968-09-01), Rowan et al.
patent: 3492232 (1970-01-01), Rosenberg
patent: 3723578 (1973-03-01), Eiseman et al.
patent: 3840463 (1974-10-01), Froeschmann et al.
patent: 3933658 (1976-01-01), Beiswanger et al.
patent: 3945930 (1976-03-01), Sugiyama et al.
patent: 3953344 (1976-04-01), Narushima
Maxwell Jerrold F.
Nassry Assadullah
BASF Wyandotte Corporation
Dunn Robert E.
Gantz Delbert E.
Pierce Andrew E.
Swick Bernhard R.
LandOfFree
Water-based hydraulic fluid and metalworking lubricant does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Water-based hydraulic fluid and metalworking lubricant, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Water-based hydraulic fluid and metalworking lubricant will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1990248