Waste treatment in silicon production operations

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423342, 423347, 423349, 55 71, 55 84, 431 5, C01B 3318

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active

045199990

ABSTRACT:
A battery of special burners, each adapted for the treatment of a particular range of waste material formed during the conversion of metallurgical grade silicon to high purity silane and silicon, is accompanied by a series arrangement of filters to recover fumed silica by-product and a scrubber to recover muriatic acid as another by-product. All of the wastes are processed, during normal and plant upset waste load conditions, to produce useful by-products in an environmentally acceptable manner rather than waste materials having associated handling and disposal problems.

REFERENCES:
patent: 2614906 (1952-10-01), Spialter et al.
patent: 3110562 (1963-11-01), Hinkle
patent: 3565590 (1971-02-01), Bracken
patent: 3954945 (1976-05-01), Lange et al.
patent: 4036938 (1977-07-01), Reed
White, "Industrial and Engineering Chemistry", vol. 51, No. 3, Mar., 1959, pp. 232-238.
"Low Cost Silicon Solar Array Project" Quarterly Progress Report, Jul.-Sep. 1978, DOE/JPL954334-78/8.
"Low Cost Silicon Solar Array Project" Quarterly Progress Report, Jan.-Mar. 1978, DOE/JPL954334-78/6.
"Low Cost Silicon Solar Array Project" Quarterly Progress Report Oct.-Dec. 1978, DOE/JPL954334-78/9.

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