Waste gas disposal apparatus and method of the same

Details Waste gas disposal apparatus and method of the same Waste gas disposal apparatus and method of the same

1997-01-22

1998-11-10

Walberg, Teresa J.

Furnaces

With exhaust gas treatment means

Afterburning means

422168, B01D 5000, F23B 500

Patent

active

058328432

ABSTRACT:
Disclosed is a waste gas disposal apparatus and method of the same which eliminates efficiently toxic components of waste gas resulted from semiconductor manufacture process prior to waste gas emission to the atmosphere, showing improvements in disposal efficiency, safety and costs.
This apparatus is comprised of an inlet head into which waste gas, inert gas and air are introduced, respectively; a heating chamber provided under the inlet head for heating up the incoming mixture gas from the inlet head to create reactant fine particles from a heating reaction; a reaction preventive unit provided in the heating chamber for making impossible to react the waste gas to the air at upper portion of the heating chamber; a scrubber unit connected to the heating chamber for scrapping off the solid dust particles adsorbed to the inner wall thereof; and a container connected to the scrubber unit by an engagement member for storing the off solid dust particles therein.

REFERENCES:
patent: 4858538 (1989-08-01), Kuypers et al.
patent: 4928615 (1990-05-01), Suwa et al.
patent: 5183646 (1993-02-01), Anderson et al.
patent: 5588381 (1996-12-01), Jennebach et al.
patent: 5645802 (1997-07-01), Yanagioka et al.
patent: 5658540 (1997-08-01), Valentino

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