Washing of wafers and wafer washing and drying apparatus

Details Washing of wafers and wafer washing and drying apparatus Washing of wafers and wafer washing and drying apparatus

1995-12-21

1998-09-15

Spisich, Mark

Brushing, scrubbing, and general cleaning

Machines

With air blast or suction

15 77, 15 883, B08B 500, B08B 1100

Patent

active

058061371

ABSTRACT:
According to the invention, there is provided a wafer washing and drying apparatus for accurately and reliably effecting the washing of wafers after slicing, mainly the removal of foreign particles attached to the wafer end faces. The apparatus comprises a washing unit including a pluralitys of brush roller pairs for washing wafers, arranged in a row in a wafer conveying direction such that they are rotated in different directions, that is, some of them being rotated in the wafer conveying direction, and the others being rotated in the opposite direction to the wafer conveying direction, their brush bundles being arranged helically in the axial direction, at least tips of the brush hair constituting the brush hair bundles being non-linear, and a drying unit including air stream blow-out nozzles for blowing out air streams upstream with respect to the wafer conveying direction.

REFERENCES:
patent: 1106492 (1914-08-01), Case
patent: 1817332 (1931-08-01), Worrall
patent: 1930575 (1933-10-01), Wynd et al.
patent: 2095697 (1937-10-01), Hammer
patent: 2282628 (1942-05-01), Whann et al.
patent: 2313606 (1943-03-01), Webb et al.
patent: 3060477 (1962-10-01), Wechsler
patent: 3213472 (1965-10-01), Cocchiaraley et al.
patent: 4774738 (1988-10-01), Lenhardt
patent: 5452490 (1995-09-01), Brundula et al.
Abstract of Laid Open Japanese Publication No. JP 63-234536.
Carufe et al., "Wafer Precleaning", IBM Technical Disclosure Bulletin, vol. 17, No. 2, Jul. 1974, New York, p. 427.

Affiliated with

Also associated with

Rating

Washing of wafers and wafer washing and drying apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Washing of wafers and wafer washing and drying apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Washing of wafers and wafer washing and drying apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-76079