Washing apparatus and washing method

Details Washing apparatus and washing method Washing apparatus and washing method

1997-08-25

2000-04-11

Gulakowski, Randy

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 37, 134 2, 134 13, 1341021, 134902, B08B 302

Patent

active

060484098

ABSTRACT:
The present invention is directed to providing an apparatus which is improved so as to remove a contamination on a substrate efficiently. This apparatus includes a jet nozzle jetting out droplets toward a substrate. A liquid supply device and a gas supply device are connected to the jet nozzle. A mixing device mixing a liquid and a gas supplied to the jet nozzle and changing the liquid into the droplets is provided in the jet nozzle.

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patent: 5456758 (1995-10-01), Menon
patent: 5555902 (1996-09-01), Menon
patent: 5873380 (1999-02-01), Kanno
Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publications, pp. 137-141, 1993.

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