Wall deposition monitoring system

Measuring and testing – Vibration – Resonance – frequency – or amplitude study

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Details

118664, G01N 2904, B05C 1100

Patent

active

059489839

ABSTRACT:
A wall deposit monitoring system for measuring variation in wall deposit thickness in an etch or deposition chamber having a contained reactive environment includes at least one quartz or other piezoelectric crystal sensor installed through a wall of the chamber using a feed-through member. A cover assembly retains the sensor at a projecting end of the feed-through member in a position in proximity with the interior of a chamber wall. The cover includes an opening providing access to the active portion of the sensor for exposure to the reactive environment. An attached oscillating device causes the active portion of the sensor to resonate. As processing is performed in the chamber, a solid reaction product accumulates on the exposed active portion, damping the vibration of the sensor. A detection device sensing the shift in frequency can then calculate the relative change in thickness for a given material. When used with highly reactive environments, the assembly is constructed of non-reactive materials which are sufficiently electrical and thermally conductive.

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Article "Observations on a Quartz Crystal Deposition Monitor" by King and Hoffman.
Relevant portions of text entitled: "Introduction to Quartz Crystal Unit Design" by Virgil E. Bottom, Ph.d.
Brochure "The Hunt For High-Performance Optical Coatings" Reprinted from the Oct. 1995 issue of Photonics Spectra, Laurin Publishing Co., Inc.

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