Wafer with a focus/exposure matrix

Details Wafer with a focus/exposure matrix Wafer with a focus/exposure matrix

1997-04-28

1999-01-05

Nuzzolillo, M.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430 9, G03C 300

Patent

active

058560521

ABSTRACT:
A focus/exposure matrix comprises a series of patterns disposed on a wafer. The patterns are arranged in rows and columns. The patterns in a row are characterized by having been formed with substantially the same exposure time and an effective focus that increments between successive row patterns by an amount substantially corresponding to half the focus resolution of the photostepper. The patterns in a column are characterized by having been formed with substantially the same effective focus and an exposure time that increments between successive column patterns by a finite amount.

REFERENCES:
patent: 4610940 (1986-09-01), Araihara
patent: 5049925 (1991-09-01), Aiton et al.
patent: 5100508 (1992-03-01), Yoshida et al.
patent: 5362585 (1994-11-01), Adams

Affiliated with

Also associated with

Rating

Wafer with a focus/exposure matrix does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer with a focus/exposure matrix, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer with a focus/exposure matrix will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-860652