Wafer wet treating apparatus

Details Wafer wet treating apparatus Wafer wet treating apparatus

1997-08-20

1998-11-24

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Having self cleaning means

134111, 134183, 134902, B08B 304

Patent

active

058394567

ABSTRACT:
A wafer wet treatment apparatus includes a first supply/discharge line, an outer bath connected to the first supply/discharge line, an inner bath within the outer bath, a second supply/discharge line connected to the inner bath, and at least one partition located on a portion of the inner bath.

REFERENCES:
patent: 5261431 (1993-11-01), Ueno et al.
patent: 5485861 (1996-01-01), Hiratsuka et al.
patent: 5511569 (1996-04-01), Mukogawa
patent: 5709235 (1998-01-01), Akanuma et al.
Yusuke Muraoka, Room Temperature Wet Cleaning Technology, 26th Symposium on ULSI Ultra Clean Technology, Dec. 1-2, 1995, pp. 134-142.

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