Wafer washing and drying apparatus

Details Wafer washing and drying apparatus Wafer washing and drying apparatus

1988-12-27

1990-02-13

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 76, 134107, 134140, B08B 310

Patent

active

048997684

ABSTRACT:
A wafer washing and drying apparatus including a chemical cleaning bath for cleaning a wafer, such as a semiconductor wafer and a silicon wafer set in a carrier, with a liquid chemical reserved therein, a rinse bath for washing off the liquid chemical attached to the wafer with a washing liquid such as pure water or an organic solvent reserved therein, an organic vapor drier for drying the wafer in contact with a vapor flow of an organic solvent and a wafer holding device having a holder for holding the wafer only to be transferred from the carrier, which holder has a heat capacity smaller than that of the carrier, and which wafer holding device has a function of transporting the wafer from the rinse bath to the organic vapor drier and a wafer transferring device for transferring the wafer from the carrier to the holder in the rinse bath. After being washed by the washing liquid, the wafer can be quickly dried by the vapor of the organic solvent, thereby preventing the generation of stains or water marks on the wafer.

REFERENCES:
patent: 3106927 (1963-10-01), Madwed
patent: 4282825 (1981-08-01), Nagatomo et al.
patent: 4715392 (1987-12-01), Abe et al.
patent: 4722752 (1988-02-01), Steck
patent: 4736758 (1988-04-01), Kusunara
patent: 4736759 (1988-04-01), Coberly et al.
patent: 4777970 (1988-10-01), Kusunara

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