Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1988-01-15
1989-10-10
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504421, H01J 2700
Patent
active
048734470
ABSTRACT:
A wafer transport apparatus for an ion implantation apparatus includes means for successively transferring wafers from a wafer cassette, inserting the wafers into an auxiliary vacuum chamber, transferring the wafers into a specific position within a vacuum processing chamber, transferring a wafer from that position to a position for ion implanation processing while at the same time transferring a processed wafer to a second position within the vacuum processing chamber, with the wafers being held retained during this transfer, successively transferring the processed wafers into a second auxiliary vacuum chamber, and transporting the wafers from the second auxiliary vacuum chamber to be inserted into a cassette, e.g. the cassette from which the wafers were originally removed. The wafers are supported or held retained by the transfer and transport means during the entire process, so that problems resulting from gravity feed of wafers along inclined surfaces, which arise with prior art apparatus of this type, are eliminated.
REFERENCES:
patent: 3968885 (1976-07-01), Hassan et al.
patent: 4550239 (1985-10-01), Nehara et al.
patent: 4553069 (1985-11-01), Purser
patent: 4558984 (1985-12-01), Garrett
patent: 4619573 (1986-10-01), Rathmann et al.
Anderson Bruce C.
Tokyo Electron Limited
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