Wafer transfer system and method of using the same

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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118723E, 118723I, 118716, 118730, 20429825, 20429835, 134 48, 134 50, 134 52, 134 61, 134 63, 134902, 414217, 414219, 414220, 414936, 414937, 414938, 414939, 414940, 438716, C23C 1600

Patent

active

060076755

ABSTRACT:
An apparatus and method are described for stripping the photoresist from a wafer while in a substantially parallel manner, another wafer is being transferred between a load lock chamber and a transfer chamber, where the processing occurs. Further, a system is described whereby two load lock chambers are employed so that processing of wafers can continue uninterrupted by a delay caused by the need to open, empty, reload and re-equilibrate a single load lock chamber. Still further, a system is described for performing multi-step dry-stripping applications requiring different conditions for two or more of the steps wherein the steps may be performed simultaneously or sequentially. Finally, a system combining a dry-stripping module and a wet-cleaning module is described which combination system permits the continuous, fully-automated dry-stripping and wet-cleaning of wafers and, upon completion of the entire processing cycle, returning wafers to their original wafer cassettes.

REFERENCES:
patent: 5084125 (1992-01-01), Aoi
patent: 5292393 (1994-03-01), Maydan et al.
patent: 5820679 (1998-10-01), Yokoyama et al.
patent: 5855681 (1999-01-01), Maydan et al.
patent: 5855726 (1999-01-01), Soraaka et al.

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