Wafer transfer apparatus and substrate transfer apparatus

Details Wafer transfer apparatus and substrate transfer apparatus Wafer transfer apparatus and substrate transfer apparatus

2011-01-25

2011-01-25

Lowe, Michael S (Department: 3652)

Material or article handling

Apparatus for moving material between zones having different...

C414S744500, C414S935000, C414S937000, C414S939000, C901S011000

Reexamination Certificate

active

07874782

ABSTRACT:
A wafer transfer apparatus is provided. In a minimum transformed state where a robot arm is transformed such that a distance defined from a pivot axis to an arm portion, which is farthest in a radial direction relative to the pivot axis, is minimum, a minimum rotation radius R, is set to exceed ½ of a length B in the forward and backward directions of an interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value obtained by subtracting a distance L0in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2<R≦B−L0).

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