Wafer tilt gauge

Optics: measuring and testing – Angle measuring or angular axial alignment – With screen

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Details

437 8, 356448, G01B 524

Patent

active

054367212

ABSTRACT:
A wafer tilt gauge includes a base support, structure for temporarily connecting a slotted apparatus for holding wafers to the base support, a light beam target connected to the base support, and a light beam source connected to the base support. The various components are positioned so that a light beam emitted from the light beam source will bounce off of a wafer disposed in a temporarily connected slotted apparatus and subsequently impinge upon the light beam target. Further, the base support is rockable, so that a first point of impingement can be obtained for a disposed wafer with the base support rocked into a first position and so that a second point of impingement can be obtained for a disposed wafer with the base support rocked into a second position.

REFERENCES:
patent: 5042945 (1991-07-01), Shibata et al.
patent: 5101226 (1992-03-01), Beaulieu et al.

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