Wafer testing and self-calibration system

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36416701, 36447806, 364552, 324757, 324765, 414225, 414226, 414935, 414936, 414937, 414939, 414941, G01R 104

Patent

active

056422989

ABSTRACT:
A measurement station which rotates a wafer in a vertical plane and moves a scanning sensor linearly along an axis which is parallel to the wafer rotation plane, thus providing a spiral, or other, scan path across the wafer. The vertical orientation reduces errors from weight induced sagging, especially of large, e.g. 300 mm wafers. The measurement station includes wafer grippers which move in the wafer's plane for securing the wafer in position for rotation. The measurement station also includes master calibration gauges which simplify calibration and obviate the need for calibration test wafers. A technique for reducing vibration and assuring scan repeatability includes coasting of the wafer in rotation and coordinated linear probe motions for scanning. Probe measurement data obtained is digitized early and calibration, demodulation, filtering and other processing is done digitally.

REFERENCES:
patent: H1373 (1994-11-01), Durham et al.
patent: 2767914 (1956-10-01), Merrill et al.
patent: 3039056 (1962-06-01), Many et al.
patent: 3039604 (1962-06-01), Bicket et al.
patent: 3775679 (1973-11-01), Abbe
patent: 3940243 (1976-02-01), Adams
patent: 3986109 (1976-10-01), Poduje
patent: 3990005 (1976-11-01), Abbe et al.
patent: 4103232 (1978-07-01), Sugita et al.
patent: 4217542 (1980-08-01), Abbe et al.
patent: 4219110 (1980-08-01), Ubukata
patent: 4311427 (1982-01-01), Coad et al.
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4457664 (1984-07-01), Judell et al.
patent: 4556317 (1985-12-01), Sandland et al.
patent: 4618938 (1986-10-01), Sandland et al.
patent: 4638601 (1987-01-01), Steere et al.
patent: 4644172 (1987-02-01), Sandland et al.
patent: 4703252 (1987-10-01), Perloff et al.
patent: 4733091 (1988-03-01), Robinson et al.
patent: 4750141 (1988-06-01), Judell et al.
patent: 4755746 (1988-07-01), Mallory et al.
patent: 4789294 (1988-12-01), Sato et al.
patent: 4803882 (1989-02-01), Schonfeld et al.
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4849916 (1989-07-01), Abbe et al.
patent: 4860229 (1989-08-01), Abbe et al.
patent: 4881863 (1989-11-01), Braginsky
patent: 4904153 (1990-02-01), Iwasawa et al.
patent: 4911597 (1990-03-01), Maydan et al.
patent: 4931962 (1990-06-01), Palleiko
patent: 5046909 (1991-09-01), Murdoch
patent: 5100276 (1992-03-01), Iwasaki et al.
patent: 5164905 (1992-11-01), Iwasaki et al.
patent: 5224809 (1993-07-01), Maydan et al.
patent: 5270222 (1993-12-01), Moslehi
patent: 5295777 (1994-03-01), Hodos
patent: 5325052 (1994-06-01), Yamashita
patent: 5456561 (1995-10-01), Poduje et al.
patent: 5479108 (1995-12-01), Cheng

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