Wafer target design and method for determining centroid of...

Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks

Reexamination Certificate

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C257SE23179

Reexamination Certificate

active

07868473

ABSTRACT:
A method for determining the centroid of a wafer target. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a target set formed therein. Next, a signal is passed over the target set and over a material separating target shapes in the target set. Then a return signal is reflected, and received, from the surface of the target shapes and the material separating them. A location of at least one maxima point of the return signal is identified. Finally, a centroid is determined as the median of the locations of at least one maxima point.

REFERENCES:
patent: 4134066 (1979-01-01), Vogel et al.
patent: 4880309 (1989-11-01), Wanta
patent: 5276756 (1994-01-01), Chambers et al.
patent: 5731109 (1998-03-01), Hwang
patent: 5760484 (1998-06-01), Lee et al.

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