Wafer surface inspection apparatus and wafer surface...

Details Wafer surface inspection apparatus and wafer surface... Wafer surface inspection apparatus and wafer surface...

2006-08-10

2008-09-02

Nguyen, Sang (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C314S018000, C250S307000

Reexamination Certificate

active

07420668

ABSTRACT:
A wafer surface inspection method and apparatus of high sensitivity, and free from performance degradation in terms of cleanliness, coordinate repeatability of foreign particles and the like. Gas for cooling is sprayed onto a laser irradiation position on the wafer surface to prevent an increase in temperature of the foreign particles and to suppress break-down of the foreign particles.

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