Wafer supporting device of a sputtering apparatus

Details Wafer supporting device of a sputtering apparatus Wafer supporting device of a sputtering apparatus

2007-06-25

2011-11-22

Hendricks, Keith (Department: 1723)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298110, C118S721000, C118S7230AN, C118S728000, C118S729000

Reexamination Certificate

active

08062487

ABSTRACT:
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a peripheral portion of the pedestal, and a cover ring positioned on the pedestal and the deposition ring. The cover ring has a gate corresponding to the recess.

REFERENCES:
patent: 5589224 (1996-12-01), Tepman et al.
patent: 5632873 (1997-05-01), Stevens et al.
patent: 5803977 (1998-09-01), Tepman et al.
patent: 5951775 (1999-09-01), Tepman
patent: 6051122 (2000-04-01), Flanigan
patent: 6171453 (2001-01-01), Chung et al.
patent: 6423636 (2002-07-01), Dordi et al.
patent: 7026009 (2006-04-01), Lin et al.
patent: 7520969 (2009-04-01), Miller
patent: 2008/0141942 (2008-06-01), Brown et al.
patent: 2004200620 (2004-07-01), None

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