Wafer support tool for heat treatment and heat treatment...

Heating – Accessory means for holding – shielding or supporting work... – Support structure for heat treating ceramics

Reexamination Certificate

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Details

C211S041180, C118S728000, C118S729000

Reexamination Certificate

active

10549805

ABSTRACT:
The present invention provides a wafer support tool for heat treatment easy in working and capable of realizing reduction in cost without generating damages or slip dislocations that would be otherwise caused by high temperature heat treatment and a heat treatment apparatus. The present invention is directed to a wafer support tool for heat treatment comprising: a plurality of wafer support members for supporting a wafer to be heat treated; and a support member holder for holding the wafer support members, wherein the wafer support members each has a contact portion with the wafer, at least one of the contact portions being movable relative to the support member holder.

REFERENCES:
patent: 6099302 (2000-08-01), Hong et al.
patent: 6953338 (2005-10-01), Kreiser et al.
patent: 7204887 (2007-04-01), Kawamura et al.
patent: 02-139935 (1990-05-01), None
patent: 07-161654 (1995-06-01), None
patent: 08-107081 (1996-04-01), None
patent: 09-129567 (1997-05-01), None
patent: 2000-91406 (2000-03-01), None
patent: 2002-164300 (2002-06-01), None
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