Wafer support plate for photolithographic apparatus

Details Wafer support plate for photolithographic apparatus Wafer support plate for photolithographic apparatus

1985-08-30

1986-09-02

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Detailed holder for original

355 53, G03B 2762

Patent

active

046092854

ABSTRACT:
Defocusing effects by undesired wafer tilt caused by photoresist debris in prior art photolithographic apparatus are substantially eliminated by a novel plate for supporting a wafer to be imaged without generating debris. Three tabs are provided along the periphery of an aperture in the plate. Each tab is provided with a spherical body, such as a ball, precisely positioned in a predetermined plane, and arranged to contact the wafer at a tangent to the surface of the spherical body. Relative movement while loading the wafer in the apparatus with respect to the supporting balls causes substantially no discernible debris from the wafer surface material. Imaging defects on the wafer due to photoresist debris are also substantially eliminated by the apparatus.

REFERENCES:
patent: 3711081 (1973-01-01), Cachon
patent: 4348105 (1982-09-01), Caprari
Article in Electronics/Oct. 23, 1980, pp. 105-108.

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