Wafer support

Details Wafer support Wafer support

1978-03-14

1980-01-08

Kendall, Ralph S.

Coating apparatus

Work holders, or handling devices

118730, 156612, 2483111R, B05C 1302

Patent

active

041822650

ABSTRACT:
A wafer support, comprising, a baseplate with an aperture therein and a hing ring rotatably positioned in the aperture. A platform is defined in the holding ring for supporting the peripheral edges of a wafer disposed therein and the holding ring includes a plurality of spaced slots extending parallel to the platform and spaced therefrom. A plurality of retaining rods are connected to the baseplate and extend into the slots to engage over the wafer positioned on the platform. A portion of the holding ring adjacent each slot defines a retaining rod abutment for urging each retaining rod out of its respective slot when the holding rod is rotated in the baseplate to release the supported wafer.

REFERENCES:
patent: 3675624 (1972-07-01), Hunts et al.
patent: 3699917 (1972-10-01), Deverse et al.
patent: 3918756 (1975-11-01), Saville et al.
patent: 4068814 (1978-01-01), Anthony et al.
patent: 4096023 (1978-06-01), Bivens
patent: 4113547 (1978-09-01), Katz

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