Wafer stage with reference surface

Electricity: motive power systems – Positional servo systems – With particular 'error-detecting' means

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Details

318647, 318567, 356401, G05B 1100

Patent

active

052851427

ABSTRACT:
An electromagnetic sub-stage and an electromagnetic monolithic stage coupled such that one follows the other having a single reference surface positioned therebetween. A sub-stage having linear motors for movement in the X-Y direction is mounted by a U bracket to a monolithic stage. The monolithic stage is suspended by flat electromagnetic coils providing precise motion of the body of the monolithic stage in X, Y, Z, and rotation about the Z axis or .theta.. Follow control means links or tracks the movement of the monolithic stage to the sub-stage such that the monolithic stage positioning coils are centered in their respective magnetic structure. Adjustable mechanical stops attached the monolithic stage in combination with air bearings riding on the reference surface limit travel of the monolithic stage in the focus or Z direction. The single reference surface extends over the entire range of motion of the monolithic stage. This improves position accuracy, and cleaning and servicing of the apparatus. The modular nature of the monolithic stage permits easy removal for inspection and repair.

REFERENCES:
patent: 4223257 (1980-09-01), Miller
patent: 4654571 (1987-03-01), Hinds
patent: 4676649 (1987-06-01), Phillips
patent: 4742286 (1988-05-01), Phillips
patent: 4952858 (1990-08-01), Galburt
patent: 5040431 (1991-08-01), Sakino et al.

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