Wafer stage operable in a vacuum environment

Details Wafer stage operable in a vacuum environment Wafer stage operable in a vacuum environment

2007-10-30

2007-10-30

Le, Dang (Department: 2834)

Electrical generator or motor structure

Dynamoelectric

Linear

C355S072000

Reexamination Certificate

active

10769668

ABSTRACT:
Methods and apparatus for enabling a stage apparatus to scan an object within a vacuum environment associated with an extreme ultraviolet lithography system are disclosed. According to one aspect of the present invention, a stage apparatus that is suitable for operation in a vacuum environment includes a coarse stage assembly that include a coarse stage and at least one air bearing that is vacuum-compatible. The stage apparatus also includes a fine stage assembly which has a fine stage that is arranged substantially adjacent to the coarse stage. The fine stage is arranged to be positioned relative to the coarse stage using electromagnetic energy.

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Hazelton, Andrew J. et al., “Wafer Stage With Magnetic Bearings” U.S. Appl. No. 10/272,930, filed Oct. 18, 2002.

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