Wafer scanning system with reciprocating rotary motion...

Material or article handling – Vertically swinging load support

Reexamination Certificate

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Details

C250S492210, C250S442110, C250S398000, C294S119100

Reexamination Certificate

active

11099022

ABSTRACT:
The present invention is directed to a scanning apparatus and method for processing a workpiece, wherein the scanning apparatus comprises a wafer arm and moving arm fixedly coupled to one another, wherein the wafer arm and moving arm are operable to rotate about a first axis. An end effector, whereon the workpiece resides, is coupled to the wafer arm. A rotational shaft couples the wafer arm and moving arm to a first actuator, wherein the first actuator provides a rotational force to the shaft. A momentum balance mechanism is coupled to the shaft and is operable to generally reverse the rotational direction of the shaft. The momentum balance mechanism comprises one or more fixed spring elements operable to provide a force to a moving spring element coupled to the moving arm. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.

REFERENCES:
patent: 4736107 (1988-04-01), Myron
patent: 5486080 (1996-01-01), Sieradzki
patent: 5737500 (1998-04-01), Seraji et al.
patent: 5741113 (1998-04-01), Bacchi et al.
patent: 5746565 (1998-05-01), Tepolt
patent: 6384418 (2002-05-01), Fujii et al.
patent: 6428266 (2002-08-01), Solomon et al.
patent: 6429442 (2002-08-01), Tomita et al.
patent: 6515288 (2003-02-01), Ryding et al.
patent: 6580083 (2003-06-01), Berrian
patent: 6777687 (2004-08-01), Vanderpot et al.
patent: 6953942 (2005-10-01), Graf et al.
patent: 2001/0032937 (2001-10-01), Berrian
patent: 2003/0068215 (2003-04-01), Mori et al.
patent: 2003/0123958 (2003-07-01), Sieradzki et al.
patent: 2003/0192474 (2003-10-01), Smick et al.
patent: 2004/0058513 (2004-03-01), Murrell et al.
patent: 2004/0191931 (2004-09-01), Murrell et al.
patent: 2005/0184253 (2005-08-01), Ioannou et al.
patent: 1 047 101 (2000-10-01), None
patent: 1 056 114 (2000-11-01), None
patent: 11 007 915 (1999-01-01), None
patent: WO 00/05744 (2000-02-01), None
patent: WO 2004/001789 (2003-12-01), None
International Search Report, Int'l Application No. PCT/US2005/011497, Int'l Filing Date May 4, 2005, 2 pgs.
International Search Report, Intl'l Application No. PCT/US2005/011581, Int'l Filing Date May 4, 2005, 2 pgs.

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