Metal working – Barrier layer or semiconductor device making
Reexamination Certificate
2007-08-14
2007-08-14
Estrada, Michelle (Department: 2823)
Metal working
Barrier layer or semiconductor device making
Reexamination Certificate
active
10523844
ABSTRACT:
A wafer rotating device1is provided with at least three rollers2rotatably provided about axes arranged at parallel intervals and which rotate over the circumferential surface of a disk-shaped wafer5, a rotation drive mechanism3that rotates and drives at least one of the rollers2, an interval adjustment mechanism4capable of adjusting the dimensions of the intervals of the rollers2, a load control device6that controls the load applied from the rollers2to the wafer5in the radial direction of the wafer5when the wafer5is clamped between rollers2. As a result, a silicon wafer can be rotated without contacting the top and bottom surfaces of the silicon wafer.
REFERENCES:
patent: 5113565 (1992-05-01), Cipolla et al.
patent: 2001/0039168 (2001-11-01), Engdahl et al.
patent: 2004/0070414 (2004-04-01), Tani
patent: 2005/0190259 (2005-09-01), Mitsuhashi et al.
patent: 6-310485 (1994-11-01), None
patent: 7-297155 (1995-11-01), None
patent: 9-269298 (1997-10-01), None
patent: 10-294304 (1998-11-01), None
patent: 2000-164681 (2000-06-01), None
International Search Report dated Nov. 11, 2003.
Eguchi Kimihiro
Kanno Takashi
Carlson & Gaskey & Olds
Estrada Michelle
Raytex Corporation
LandOfFree
Wafer rotation device and edge flaw inspection apparataus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wafer rotation device and edge flaw inspection apparataus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer rotation device and edge flaw inspection apparataus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3840872