Wafer processing method

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Reexamination Certificate

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Details

C219S405000, C219S411000, C392S416000, C392S418000, C118S724000, C118S725000, C118S050100, C118S728000

Reexamination Certificate

active

07138606

ABSTRACT:
A wafer processing method for use with a wafer processing apparatus having a liquid cooling jacket with a built-in coolant liquid circulation path and a ceramic plate as attached onto the liquid cooling jacket and having therein a heater and an electrode for an electrostatic chuck. The method enables performance of wafer processing while letting a wafer be mounted on the ceramic plate by a wafer transport. The method includes causing the wafer transport to transport the wafer onto the ceramic plate, pre-heating the wafer while the wafer is held on the ceramic plate for a predetermined length of time, and mounting the preheated wafer on the ceramic plate.

REFERENCES:
patent: 5709757 (1998-01-01), Hatano et al.
patent: 5835334 (1998-11-01), McMillin et al.
patent: 5851298 (1998-12-01), Ishii
patent: 6140256 (2000-10-01), Ushikawa
patent: 6483081 (2002-11-01), Batchelder
patent: 6492621 (2002-12-01), Ratliff et al.
patent: 6518548 (2003-02-01), Kaneko et al.
patent: 6521503 (2003-02-01), Jacobson et al.
patent: 7-176601 (1995-07-01), None
patent: 2001-110885 (2001-04-01), None

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