Drying and gas or vapor contact with solids – Apparatus – Houses – kilns – and containers
Patent
1986-04-17
1988-02-16
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
Houses, kilns, and containers
34239, 34236, 118725, 118728, 165 804, F26B 904
Patent
active
047246219
ABSTRACT:
A wafer is introduced into a processing chamber on a transport device. Lifting pins receive the wafer from the transport device and lower the wafer to the surface of a chuck. Clamping pins lower and hold the wafer by means of enlargements on the ends of the clamping pins. Grooves on the surface of the chuck and internal channels in the chuck are used to supply gas to the back of the wafer for temperature control.
REFERENCES:
patent: 3645581 (1972-02-01), Lasch, Jr. et al.
patent: 4313266 (1982-02-01), Tam
patent: 4512391 (1985-04-01), Harra
patent: 4514636 (1985-04-01), King
patent: 4565601 (1986-01-01), Kakehi et al.
Dick Paul H.
Hobson Phillip M.
Cole Stanley Z.
Fisher Gerald M.
Schwartz Larry I.
Varian Associates Inc.
Warsh Kenneth L.
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