Wafer processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156639, 156640, 156643, H01L 21306, B44C 122

Patent

active

051713934

ABSTRACT:
A semiconductor wafer processing station comprising a plasma etching unit, a wet processing spin-spray unit, a robotic wafer transfer arm, and a central control computer all contained in a single housing. The apparatus is designed to perform manufacturing tasks especially related to photoresist processing: photoresist developing, descumming, baking and hardening, and stripping. The apparatus follows preprogrammed instructions which allow the station to automatically perform wafer processing routines by removing wafers from a storage cassette, then transferring the wafers to the processing unit with the robotic arm. Custom processing procedures are programmable, allowing practical small-scale low volume wafer development. Wafer processing routines envisioned include photoresist application and developing, plasma etching and descumming, and procedures involving multiple processing steps utilizing both the plasma/oven unit and the wet chemical spin-spray unit. Such routines would perform precision etching or serve to remove contaminants produced in the photoresist processing procedures.

REFERENCES:
patent: 4161356 (1979-07-01), Giffin et al.
patent: 4715921 (1987-12-01), Maher et al.
patent: 4875989 (1989-10-01), Davis et al.
patent: 4908095 (1990-03-01), Kagatsume et al.
patent: 4971653 (1990-11-01), Powell et al.
patent: 4986877 (1991-01-01), Tachi et al.
patent: 4992136 (1991-02-01), Tachi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Wafer processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Wafer processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2090329

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.