Wafer processing apparatus

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type

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Details

414416, 414937, 414939, 118719, 432239, H01L 2168

Patent

active

056977492

ABSTRACT:
The present invention refers to a wafer transfer robot for a wafer boat of a wafer processing apparatus wherein a turntable within a chamber of a turntable apparatus is provided with a prescribed number of stations formed thereon. Each of the stations is provided with protrusions that hold a wafer cassette that is transferred thereto and orientated thereon in such a manner that a base surface thereof is inclined at an angle to the outward direction. Although, while the wafer cassette is being transferred and orientated, it is transferred and orientated reliably with the base surface thereof held horizontal by an elevator apparatus. By providing a loadlock chamber of a rotational configuration, the apparatus of the present invention ensures good sealing, and also ensures that when regions within the apparatus are being evacuated or being filled with an inert gas, they are kept reliably airtight. The generation of particles due to linear frictional movement is thus prevented, and the wafer processing can be performed extremely reliably and efficiently.

REFERENCES:
patent: 4664578 (1987-05-01), Kakehi
patent: 4776744 (1988-10-01), Stonestreet et al.
patent: 4781511 (1988-11-01), Harada et al.
patent: 4785962 (1988-11-01), Toshima
patent: 4867629 (1989-09-01), Iwasawa et al.
patent: 4990047 (1991-02-01), Wagner et al.
patent: 5048164 (1991-09-01), Harima
patent: 5162047 (1992-11-01), Wada et al.
patent: 5273423 (1993-12-01), Shiraiwa
patent: 5277579 (1994-01-01), Takanabe

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