Wafer probe station having auxiliary chucks

Details Wafer probe station having auxiliary chucks Wafer probe station having auxiliary chucks

1992-05-29

1993-08-17

Karlsen, Ernest F.

Electricity: measuring and testing

Measuring, testing, or sensing electricity, per se

With rotor

324158P, G01R 3102, G01R 1073

Patent

active

052372677

ABSTRACT:
A wafer probe station has a wafer-supporting vacuum chuck, together with one or more substrate-supporting auxiliary vacuum chucks having independent vacuum controls for mounting contact substrates and calibration substrates simultaneously with the wafer. A detachable interconnection of the various chucks enables independent replacement of each chuck to accommodate various different chuck types, and also permits the elevations of the respective chuck surfaces to be adjusted relative to each other to compensate for differences in thicknesses between the wafer substrate and the calibration or contact substrates. The invention is especially useful in wafer probe stations equipped with enclosures for controlled-environment testing where a large variety of different wafer chucks must be readily interchangeable for testing under different conditions.

REFERENCES:
patent: 3710251 (1973-01-01), Hagge et al.
patent: 5077523 (1991-12-01), Blanz
Cascade Microtech, Inc., "Summit 9000 Series Analytical Probe Station," 1990.
Cascade Microtech, "Introducing the Peak of Analytical Probe Stations," MicroProbe Update, 1990, pp. 1-3.
Cascade Microtech, Inc., "Mechanical Operation," Summit 9000 Analytical Probe Station, 1990, pp. 3-8 to 3-9.

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