Wafer positioning mechanism using a notch formed on the wafer pe

Material or article handling – Article reorienting device – Article frictionally engaged and rotated by relatively...

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198394, 414433, B65G 4724

Patent

active

050282000

ABSTRACT:
A positioning mechanism for wafers put in a container, wherein a notch is formed on the periphery of the wafer. The positioning mechanism includes a drive roller coupled to a drive source, an arm member, a first end thereof being fixed and a second end having a protrusion. The arm is elastically movable in the direction of the wafer surface, and the protrusion has a shape corresponding to the notch of the wafer. A transmission roller is supported between the first and second ends of the arm member. The axes of the drive roller and transmission roller are in the vicinity of the wafer so that the transmission roller is driven by the drive roller while the protrusion contacts with the periphery of the wafer outside the notch region. The transmission roller loses contact with the drive roller when the protrusion is engaged with the wafer notch.

REFERENCES:
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patent: 3820647 (1974-06-01), Waugh, Jr. et al.
patent: 4311427 (1982-01-01), Coad et al.
patent: 4441853 (1984-04-01), Kosugi
patent: 4662811 (1987-05-01), Hayden
patent: 4813840 (1989-03-01), Prubhakar et al.
patent: 4887904 (1989-12-01), Nakazato et al.
patent: 4892455 (1990-01-01), Hine
"Semiconductor Wafer Alignment Fixture", IBM Technical Disclosure Bulletin, vol. 10, No. 6, Nov. 1967.
"Wafer Chuck Air Flow", IBM Technical Disclosure Bulletin, vol. 18, No. 6, Nov. 1975.

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