Wafer position detecting method and apparatus

Details Wafer position detecting method and apparatus Wafer position detecting method and apparatus

1987-09-04

1989-02-21

Wan, Gene

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

250561, G01N 2180

Patent

active

048067733

ABSTRACT:
A wafer position detecting device includes a laser source, a mirror for receiving the laser beam and reflecting it to a photosensor. Optically between the laser source and the photosensor, there is located a wafer cassette containing plural semiconductor wafers in the manner that the optical path of the laser is parallel to the surface of the wafer in the cassette, namely that the laser beam can incident on the edge of the wafer parallel to the surface thereof. Relative movement is caused between the wafer and the laser beam in the direction perpendicular to the wafer surface. The space or the wafer can be detected on the basis of the output of the photosensor.

REFERENCES:
patent: 3902615 (1975-09-01), Levy et al.
patent: 4461567 (1984-07-01), Mayer

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