Wafer orientation alignment system

Details Wafer orientation alignment system Wafer orientation alignment system

1996-10-10

1997-11-25

Garrett, Felisa

Coating apparatus

Gas or vapor deposition

117 85, 118720, 20419213, C23C 3600

Patent

active

056907443

ABSTRACT:
An apparatus and method for precisely calibrating the transfer arm of a multiple station wafer processing system without breaking vacuum and with a minimum of system downtime is provided. A system of determining and properly aligning the crystallographic orientation of the wafers before processing as well as monitoring the orientation of individual wafers during wafer transfer between processing stations is also provided.

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patent: 5483138 (1996-01-01), Smookler et al.
patent: 5511005 (1996-04-01), Abbe et al.

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