Wafer monitoring system

Cleaning and liquid contact with solids – Apparatus – With work feeding and/or discharging means

Reexamination Certificate

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Details

C134S902000, C414S806000

Reexamination Certificate

active

06964276

ABSTRACT:
A wafer monitoring system including a gripper operative to fixedly hold a wafer, a bottom buffering unit comprising at least one supporting element adapted to support a wafer, a top buffering unit comprising at least two supporting elements adapted to support a wafer, a first actuator operative to effect relative movement between at least two supporting elements of the top buffering unit, monitoring apparatus operative to perform processing steps on a wafer while the wafer is held fixed to the gripper, and an actuator operative to effect relative movement between the gripper and the top and bottom buffering units, the top and bottom buffering units being operative to buffer processed and unprocessed wafers thereby to enable a robot to arrive at and leave the monitoring apparatus with at least one wafer thereon.

REFERENCES:
patent: 4775281 (1988-10-01), Prentakis
patent: 5171031 (1992-12-01), Nishiyama
patent: 5566466 (1996-10-01), Hearne
patent: 5700046 (1997-12-01), Van Doren et al.
patent: 5851041 (1998-12-01), Anderson et al.
patent: 6036426 (2000-03-01), Hillman
patent: 6082950 (2000-07-01), Altwood et al.
patent: 6099643 (2000-08-01), Ohtani et al.
patent: 6174011 (2001-01-01), Keigler
patent: 6212961 (2001-04-01), Dvir
patent: 6267423 (2001-07-01), Marohl et al.
patent: 6273484 (2001-08-01), Peng
patent: 6309163 (2001-10-01), Nering
patent: 6343905 (2002-02-01), Adams et al.
patent: 6368182 (2002-04-01), Dvir et al.
patent: 6390767 (2002-05-01), Alper et al.
patent: 6485253 (2002-11-01), Adams et al.
patent: 6543461 (2003-04-01), Haimovich et al.
patent: 6619144 (2003-09-01), Dvir
patent: 62295839 (1987-12-01), None

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