Wafer level packaging technique for microdevices

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor

Reexamination Certificate

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Details

C438S118000, C438S121000, C438S051000

Reexamination Certificate

active

07138293

ABSTRACT:
A method is disclosed for fabricating a integrated device, such as a MEMS device. A first wafer is provided on an exposed surface with a layer of gold, gold alloy or gold compound. A second wafer is provided on its exposed surface with under-layer of gold, gold alloy or gold compound; and an over- of bismuth, bismuth alloy, a compound of bismuth, cadmium, cadmium alloy, a compound of cadmium compound, tin, tin alloy, or a compound of tin. The wafers are then brought into contact and bonded at their surfaces through the deposited layers.

REFERENCES:
patent: 2002/0071169 (2002-06-01), Bowers et al.
patent: 2002/0096421 (2002-07-01), Cohn et al.
patent: 2002/0179986 (2002-12-01), Orcutt et al.
patent: 2003/0116845 (2003-06-01), Bojkov et al.
patent: 2003/0151479 (2003-08-01), Stafford et al.
patent: WO 01/98786 (2001-12-01), None
patent: WO 02/42716 (2002-05-01), None

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