Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-11-06
2007-11-06
Nguyen, Sang H. (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C250S216000, C358S302000, C382S281000
Reexamination Certificate
active
11332195
ABSTRACT:
A method is described that adjusts the position of a item and sets a tilt angle for each of a plurality of micro-mirrors of a digital micro-mirror device. The setting of the tilt angles is to establish a filter within the optical channel of an inspection tool that inspects the item. The filter is to reduce noise received at an optical detection device. The tilt angle settings are a function of the position. The method also includes comparing information from the optical detection device that describes an inspected region of the item's surface against an expected version of the information.
REFERENCES:
patent: 5506676 (1996-04-01), Hendler et al.
patent: 5587832 (1996-12-01), Krause
patent: 5623281 (1997-04-01), Markandey et al.
patent: 5796508 (1998-08-01), Suzuki
patent: 5923466 (1999-07-01), Krause et al.
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6248988 (2001-06-01), Krantz
patent: 6375903 (2002-04-01), Cerrina et al.
patent: 6399935 (2002-06-01), Jovin et al.
patent: 6560020 (2003-05-01), Kramer
patent: 6753947 (2004-06-01), Meisburger et al.
patent: 6788210 (2004-09-01), Huang et al.
patent: 6870554 (2005-03-01), Jain
patent: 6870659 (2005-03-01), Aubuchon
patent: 6898004 (2005-05-01), Shimizu et al.
patent: 6922483 (2005-07-01), Doane
patent: 7119940 (2006-10-01), Knipe
Winston, A. Saunders , et al., “Wafer Inspection With A Customized Reflective Optical Channel Component” U.S. Appl. No. 10/956,288, Confirmation No. 7041, filed Sep. 30, 2004, Office Action dated Feb. 28, 2006, pp. 1-13.
Winston, A. Saunders , et al., “Wafer Inspection With A Customized Reflective Optical Channel Component” U.S. Appl. No. 10/956,288, Confirmation No. 7041, filed Sep. 30, 2004, Final Office Action dated Jul. 28, 2006, pp. 1-12.
Dudley, D., et al., “Emerging Digital Micromirror Device (DMD) Applications”, SPIE Proceedings, vol. 4985;2003, pp. 12, DLP Texas Instruments, Inc., Society of Photo-Optical Instrumentation Engineers.
Liang, M., et al., Cofocal pattern period in multiple-aperture confocal imaging systems with coherent illumination, Jun. 1, 1997, Optics Letter, vol. 22, No. 11, pp. 751-753.
Macaulay, C., et al. “Use of digital micro mirror devices in quantitative microscopy,” Proc. SPIE, vol. 3260, 1998, p. 201-206.
Dlugan, A.L.P., et al. “Improvements to quantities microscopy through the use of digital micromirror devices,” Proc. SPIE 3221, pp. 6-11, 2000.
Hanley, Q.S., et al., An optical sectioning programmable array microscope implemented with a digital micromirror device, Journal of Microscopy, vol. 196, Pt.3;1999; pp. 317-331.
Wagner, E.P., “Construction and Evaluation of a Visible Spectrometer Using Digital Micromirror Spatial Light Modulation”, Applied Spectroscopy, vol. 49, No. 11, pp. 1715-1719, 1995.
Deverse, R.A., et al., “Realization of the Hadamard Multiplex Advantage using a Programmable Optical Mask in a Dispersive Flat-Field near-Infrared Spectrometer,” Applied Spectroscopy, vol. 54, No. 12, 2000, pp. 1751-1758.
Dudley, D. et al., “Emerging Digital Micromirror Device (DMD) Applications”, Texas Instruments, Inc., pp. 10, publicly available not later than Sep. 29, 2004.
Hornbeck, L., “Digital Light Processing™: A New MEMS-Based Display Technology”, Texas Instruments, pp. 18, publicly available not later than Sep. 29, 2004.
Douglass, M.R., “Lifetime Estimates and Unique Failure Mechanisms of the digital Micromirror Device (DMD)”, Texas Instruments, Digital Imaging, pp. 12, publicly available not later than Sep. 29, 2004.
Hornbeck, L., “Current Status and Future Applications for DMD™-Based Projection Displays”, Texas Instruments, Digital Imaging, pp. 4, publicly available not later than Sep. 29, 2004.
Yoder, L, “The Digital Display Technology of the Future”, pp. 1-11, DLP A Texas Instruments Technology, Jun. 5-7, INFOCOMM 1997.
A.L.P. Dlugan, C.E. MacAulay and P.M. Lane, “Improvements to quantitative microscopy through the use of digital micromirror devices,” Proc. SPIE 3921, pp. 6-11. 2000.
J.B. Sampsell, “The Digital Micromirror Device and Its Application To Projection Displays,” Texas Instruments, Inc., Microelectronics and Nanometer Structures, 1994, vol. 12, No. 6, p. 3252-6, May-Jun. 1994, IEEE, Op. Soc. America.
Clarke James S.
Saunders Winston A.
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