Wafer inspection device

Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation

Reexamination Certificate

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Details

C324S719000

Reexamination Certificate

active

10563499

ABSTRACT:
A semiconductor substrate or wafer inspection device for detecting defects on wafer surfaces includes an air-cushion stage which can be displaced in two directions (X,Y) that are perpendicular to one another. Several air nozzles are provided for this purpose. At least one valve is connected to at least one electric control unit, the valve being configured in such a way that a normal pressure prevails in the air nozzles when the electric control unit delivers a corresponding signal.

REFERENCES:
patent: 3967132 (1976-06-01), Takamine
patent: 5421894 (1995-06-01), Lei et al.
patent: 6510755 (2003-01-01), Higuchi et al.
patent: 6732610 (2004-05-01), Higuchi et al.
patent: 6864602 (2005-03-01), Korenaga
patent: 7241993 (2007-07-01), Nakasuji et al.
patent: 2001/0030739 (2001-10-01), Hase et al.
patent: 01 230986 (1989-09-01), None

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