Wafer holding, wafer support member, wafer boat and heat...

Details Wafer holding, wafer support member, wafer boat and heat... Wafer holding, wafer support member, wafer boat and heat...

2007-04-17

2007-04-17

Kackar, Ram N. (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S728000, C118S724000, C206S832000, C219S444100, C219S544000, C392S416000, C392S418000, C432S005000, C432S152000, C432S241000, C432S253000, C432S258000, C432S259000

Reexamination Certificate

active

10149939

ABSTRACT:
The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering productivity and at low cost, in the high temperature heat treatment of silicon wafers, and said wafer holder is characterized in that: the wafer holder is composed of a wafer support plate and three or more wafer support members mounted on said wafer support plate, each of the wafer support members having a wafer support portion or more; at least one of said wafer support members is a tilting wafer support member which has a plurality of upward-convex wafer support portions on the upper surface and is tiltable with respect to said wafer support plate; and the wafer is supported by at least four wafer support portions.

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