Wafer holding tool for ion implanting apparatus

Details Wafer holding tool for ion implanting apparatus Wafer holding tool for ion implanting apparatus

2011-06-07

2011-06-07

Porta, David P (Department: 4177)

Radiant energy

Means to align or position an object relative to a source or...

C250S492210, C279S085000

Reexamination Certificate

active

07956335

ABSTRACT:
A wafer holding assembly is provided that is capable of preventing the temperature difference generated between a wafer and a holding pin through beam irradiation.In one embodiment, the wafer holding assembly has a plurality of holding pins for holding a wafer in the ion implanting apparatus, the holding pin comprises a head contacting with an end face of the wafer to control motion of the wafer and a flange projecting from the head to place the wafer, and the head is provided with a canopy portion extending in a direction different from a side placing the wafer.

REFERENCES:
patent: 5930643 (1999-07-01), Sadana
patent: 6146463 (2000-11-01), Yudovsky et al.
patent: 2002/0185163 (2002-12-01), Peace et al.
patent: 2003/0024557 (2003-02-01), Olgado et al.
patent: 2007/0199656 (2007-08-01), Leavitt et al.

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